Copper sputtering targets are circular plates made of high purity copper or copper alloys that are used for thin film deposition through a physical vapor deposition (PVD) process called sputtering. Copper targets are primarily used for the metallization process in the manufacturing of semiconductors and integrated circuits (ICs). The sputtering of copper targets allows for depositing of an even layer of copper on semiconductor wafers which are further processed to produce various electronic ... Read more
