Plasma Etching Equipment Market — Technological Growth Map Over Time To Understand The Industry Growth Rate
Plasma etching is a type of plasma processing used extensively in the fabrication process of integrated circuit. Plasma etching is also referred to as dry etching system, as the conventional etching technique is carried out with various corrosive wet chemical acids. During the process of plasma etching, the material to be etched is converted from solid state to gaseous state by the plasma of the process gases and a vacuum pump is used to extract the gaseous products. Generally, three basic etching processes including ion etching, chemical plasma etching and reactive ion etching are used to fabricate integrated circuits depending on applications for which it is used.
The overall market growth of plasma etching equipment is majorly dependent on the growth of the semiconductor market across the globally. The global plasma etching equipment market is anticipated to experience a stable growth during the forecast period owing to the extensive technological advancement taking place in the integrated circuit manufacturing techniques across different parts of the world.
In order to provide an exhaustive analysis of the market, the global plasma etching equipment market is segmented on the basis of product type and geography. Different types of plasma etching equipment available in the market includes barrel type plasma etching equipment and planar type plasma etching equipment. In addition, cross sectional analysis of the above mentioned segment across different regions including Asia Pacific, North America, Europe, Middle-East and Africa (MEA) and Latin America is also provided in this report.
Rising demand for compact, energy efficient and electronic devices having enhanced performance is predicted to trigger the need of developing miniature semiconductor integrated circuits. For miniaturizing integrated circuit, the circuit have to undergo advanced circuit fabrication process with small geometries and thus requires precise pattern transfer. This in turn is anticipated to boost the demand for plasma etching equipment during the forecast period from 2017 to 2025.
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